.jpg)
Electron Microprobe Software
Probe Software is dedicated to offering the best software for acquisition, automation and analysis for modern Jeol and Cameca electron microprobes. Unlike OEM instrument companies we do not sell hardware, instead we specialize in producing state-of-the-art software and are solely committed to producing the best user interface possible for your Electron Probe Micro Analyser (EPMA). By listening to our extensive customer base we make that special effort to implement your specific requirements and unique features to enable the ease of use you expect for your professional work.
See Probe Software at Microscopy & Microanalysis (M&M), Portland, OR
8/2/2010 to 8/5/2010 in Booth #1243
Probe Software will be offering the following EPMA Tutorials at our booth:
Monday, August 2nd, 5:30 PM, Paul Carpenter: "Using Probe for EPMA: Advances in EPMA and Problem Solving Methods in Microanalysis"
An general overview of the state of the art in EPMA software, with special attention to new methods and techniques for solving everyday problems in the lab. These will include but not be limited to analysis strategies, modeling analytical conditions using our free CalcZAF software, analysis setup, modern instrument automation options, sample navigation and quick and easy documentation of analytical results, conditions, errors and accuracy.
Tuesday, August 3rd, 5:30 PM, John Donovan: "Pushing the Envelope for Beam Sensitive Samples and Trace Element Sensitivity and Accuracy"
At a sufficiently long count time, high enough beam current or finely focused beam, almost every sample is beam sensitive to some degree. Learn how to quickly utilize time dependent intensity (TDI) corrections to automatically correct for both intensity loss or gain due to element migration or sample damage. In addition learn how to attain single digit ppm elemental sensitivity through improved spectrometer geometric efficiencies without any modifications to your instrument hardware or electronics while automatically correcting for systematic accuracy errors in your instrument using a newly developed "blank" correction, to obtain accuracy that equals your measurement precision.
Wednesday, August 4th, 5:30 PM, Julien Allaz: "Optimizing Background Measurement Accuracy Using Multi-Point Background Positions"
High accuracy trace element analysis in complex and inhomogeneous materials presents special analytical problems primarily due to uncertainly in the optimum placement of background measurement positions. A new multi-point background acquisition and analysis technique allows the analyst to easily and automatically determine the best possible background fit without time consuming high precision wavescans. See how this simple technique can simplify your characterization of trace elements in complex unknown materials with minimum setup time.
Compatible, Flexible and Powerful
Probe For EPMA (for automation and quantitative analysis) and Probe Image (for imaging and x-ray mapping) are both designed for maximum compatibility to interface SIMULTANEOUSLY with your existing Jeol 8800/8900, 8100/8200, 8500 and Cameca SX100 computer systems. Probe Software utilizes a sophisticated and advanced native TCP/IP implementation for all instrument communication, therefore no alteration to your current system is required. This means that both the OEM and Probe Software applications can work together to improve your productivity and expand your analytical options.
Industrial Strength, Research Quality Products
Probe Software application suites are designed for total data integrity and stability with robust coding techniques and Transactional Processing methods for data transfer used by financial institutions. Working with scientists at NIST, California Institute of Technology, NASA, MIT, Sandia National Lab, the Smithsonian Institution, UC Berkeley and other major research laboratories, Probe Software, Inc. offers applications which implement the latest and most advanced algorithms and methods available to microscopy from the user perspective.
All software is tightly integrated and designed to maximize your laboratory productivity. All instrument configuration, x-ray intensity, imaging, peak scans, PHA scans, EDS spectrums and coordinate data within each probe run are automatically saved to a flexible relational database format using transactional processing for maximum data stability and easy portability for off-line processing. Designed by microanalysis experts for microanalysis experts, these products incorporate a large number of specialized tools to make even the most difficult analytical task easier and more accurate.
|
Quantitative Spectral Interferences (publication) Probe for EPMA seamlessly incorporates the scientific standard for fully quantitative spectral interference corrections for wavelength dispersive (WDS)
x-ray intensities down to trace levels even with high magnitude overlaps. Based on a full iterated matrix correction procedure, Probe For EPMA can even handle pathological cases of cascade and self-interfering spectral interferences. |
Automatic Mosaic Imaging (abstract, Scanning, 1997) Probe Image is designed from the bottom up to quantitatively handle both spatial coordinate and signal intensity dimensions. Since image resolution is independently defined from the image aspect ratio, the automated creation of large area mosaic images from image grids or randomly acquired areas is easily performed. |
|
Volatile Element Calibrations Based on a fully iterated procedure, Probe for EPMA can correct for both intensity loss and gain as a function of time and apply a matrix correction to the modified intensities automatically. All calibration parameters and values are saved
for archival purposes and can be adjusted during data reprocessing. |
Complete Image Automation Acquire any number of image sets based on any number of instrument conditions, with complete automation of spectrometer positions for on and off-peak images. Z axis stage control for maintaining x-ray focus over large areas is an integral part of Probe Image. |
|
Mean Atomic Number Background Modeling (publication) Probe for EPMA offers a unique background modeling technique which allows fast and accurate background corrections without off-peak measurements for both major and minor elements along with linear, averaged, exponential and polynomial fit off-peak backgrounds for maximum flexibility and efficiency. |
Arbitrary Beam and Stage Scan Areas Using beam and stage scan instrument primitives, Probe Image's sophisticated software algorithms can automatically acquire analog signal and x-ray intensity maps over samples areas of any defined shape with any pixel resolution. No limits to your imaging! |
High Performance Analysis and Acquisition Options Available:
Spectrum Integration: Fully automatic integrated acquisition of EDS spectra with simultaneous WDS acquisition. Because the complete energy spectrum for all standards and unknowns are automatically stored along with all detector and acquisition parameters, the user can add and remove elements by EDS to be quantified with the WDS elements at any time, including off-line data processing. Currently we support Thermo NSS and Bruker Esprit. Other OEM EDS interfaces are available upon request.
Remote: A device independent COM server for creating user customized applications for stage, column and spectrometer control and acquisition of your microprobe instrument. Easy to use, fully documented and can be called from any COM compliant container such as Excel, Word, Access, Grapher, Surfer, Matlab or Visual Basic.
Matrix: An ultra fast quantitative correction COM server for creating user customized applications for matrix corrections (including 10 different ZAF and phi-rho-z algorithms, 6 different mass absorption coefficient tables (including NIST's latest FFAST tables) and also user accessible quantitative spectral interference and MAN and off-peak background correction methods. Easy to use, fully documented and can be called from any COM compliant container such as Excel, Word, Access, Grapher, Surfer, Matlab or Visual Basic.
Support for your older instrument? Contact